Method for fabricating planar light waveguide circuits with...

Details Method for fabricating planar light waveguide circuits with... Method for fabricating planar light waveguide circuits with...

2005-02-22

2005-02-22

Lee, John R. (Department: 2881)

Optical waveguides

Planar optical waveguide

C385S043000, C438S031000

Reexamination Certificate

active

06859602

ABSTRACT:
Disclosed is a method for fabricating planar light waveguide circuits, wherein the circuit has a structure that includes a substrate comprised of a core and under-clad layers, an optical circuit, and a plurality of arrayed waveguides coupled thereon. More specifically, the method includes the steps of layering a hard layer on the core layer for forming a mask pattern of the planar light waveguide circuit; forming the mask pattern on the hard layer; layering a photoresist layer on a branch of the optical circuit and the arrayed waveguides of the mask pattern; forming a vertical taper structure on the photoresist layer using a gray scale mask; and, etching the core layer using the photoresist layer with the vertical taper structure and the mask pattern.

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“Very Low Insertion Loss Arrayed-Waveguide Grating with Vertically Tapered Waveguides;” A. Sugita et al., XP000968634; Sep. 2000; pp. 1180-1182.
“A Review on Fabrication Technologies for the Monolithic Integration of Tapers with III-V Semiconductor Devices;” I. Moerman et al.; XP002146284; Dec. 1997; pp. 1308-1320.

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