Method for fabricating organic thin film

Details Method for fabricating organic thin film Method for fabricating organic thin film

1997-09-05

1999-10-19

Bowers, Charles

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

438939, 438623, 438622, 438779, 438780, 438761, 438781, H01L 21265

Patent

active

059703814

ABSTRACT:
A method is provided that produces a good, strong organic monomolecular film having its atoms arranged in a three-dimensionally ordered manner by cleaving a III-V group compound semiconductor substrate in film formation molecules or in a solution containing them, in order to cause selective chemisorption which forms a monomolecular film and then deposits another layer of organic molecule film. In this method, the III-V group compound semiconductor substrate is cleaved in a solution containing SH groups dissolved into a solvent in order to form a self-assembled monolayer and is then placed in another solution, where metallic ions are adsorbed to the surface of the film or where the functional groups are converted by chemical treatment. The substrate is then immersed in a solution containing organic molecules that are selectively chemisorbed to the functional groups. This process is sequentially repeated to form good, strong multilayers having a three-dimensionally ordered arrangement while also controlling film thickness.

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N. Tillman, et al. "Formation of Multilayers by Self-Assembly", Langmuir, vol. 5, No. 1 (1989), pp. 101-111.

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