Method for fabricating nanoscale thermoelectric device

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer

Reexamination Certificate

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Details

C438S445000, C438S551000, C438S666000, C257SE21251, C257SE21463, C257SE21589, C257SE29001, C257SE51001, C977S700000, C977S762000, C977S781000, C977S833000, C977S888000

Reexamination Certificate

active

07960258

ABSTRACT:
The present invention discloses a method for fabricating a nanoscale thermoelectric device, which comprises steps: providing at least one template having a group of nanoscale pores; forming a substrate on the bottom of the template; injecting a molten semiconductor material into the nanoscale pores to form a group of semiconductor nanoscale wires; removing the substrate to obtain a semiconductor nanoscale wire array; and using metallic conductors to cascade at least two semiconductor nanoscale wire arrays to form a thermoelectric device having a higher thermoelectric conversion efficiency.

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J. R. Lim, J. F. Whitacre, J. P. Fleurial, C. K. Huang, M. A. Ryan, N. V. Myung, Adv. Mater. 2005, 17, 1488.

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