Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – On insulating substrate or layer
Reexamination Certificate
2011-06-14
2011-06-14
Lebentritt, Michael S (Department: 2829)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
On insulating substrate or layer
C438S445000, C438S551000, C438S666000, C257SE21251, C257SE21463, C257SE21589, C257SE29001, C257SE51001, C977S700000, C977S762000, C977S781000, C977S833000, C977S888000
Reexamination Certificate
active
07960258
ABSTRACT:
The present invention discloses a method for fabricating a nanoscale thermoelectric device, which comprises steps: providing at least one template having a group of nanoscale pores; forming a substrate on the bottom of the template; injecting a molten semiconductor material into the nanoscale pores to form a group of semiconductor nanoscale wires; removing the substrate to obtain a semiconductor nanoscale wire array; and using metallic conductors to cascade at least two semiconductor nanoscale wire arrays to form a thermoelectric device having a higher thermoelectric conversion efficiency.
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J. R. Lim, J. F. Whitacre, J. P. Fleurial, C. K. Huang, M. A. Ryan, N. V. Myung, Adv. Mater. 2005, 17, 1488.
Chao Chuen-Guang
Chen Jung-Hsuan
Yang Ta-Wei
Lebentritt Michael S
National Chiao Tung University
Rosenberg , Klein & Lee
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