Method for fabricating liquid crystal display device

Details Method for fabricating liquid crystal display device Method for fabricating liquid crystal display device

2006-10-24

2006-10-24

Lee, Hsien-Ming (Department: 2823)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S151000, C438S164000, C438S171000

Reexamination Certificate

active

07125756

ABSTRACT:
Disclosed is a method for fabricating a thin film transistor for a liquid crystal display device using four masks and without using a diffraction mask. The method of the present invention uses a first mask when forming a gate electrode, a second mask when forming an active pattern, a third mask when forming a plurality of contact holes at an upper portion of a channel layer, and a fourth mask when forming a pixel electrode and source and drain electrodes, so that the resulting liquid crystal display device may be completed by four masks without using a diffraction exposure method. Instead of using a diffraction mask, the present invention uses different etching rates between an insulating layer and an electrode layer, which is used for source and drain electrodes, in fabricating a thin film transistor.

REFERENCES:
patent: 6515300 (2003-02-01), den Boer et al.
patent: 2004/0036816 (2004-02-01), Yun
patent: 2005/0142714 (2005-06-01), Chae et al.

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