Method for fabricating liquid crystal display device

Details Method for fabricating liquid crystal display device Method for fabricating liquid crystal display device

2011-08-02

2011-08-02

McPherson, John A. (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S319000, C430S321000

Reexamination Certificate

active

07989147

ABSTRACT:
Disclosed is a method for fabricating a liquid crystal display device comprising: providing a first substrate having a pixel portion and a pad portion; sequentially laminating a gate insulating layer, a semiconductor layer and a first conductive layer on the first substrate where a gate electrode is formed; forming a first PR pattern, which is patterned relatively thin on a channel region of a transistor to be formed, on the first conductive layer with a half-tone mask; patterning the first conductive layer with the first PR pattern; forming a second PR pattern which is aligned with an outer periphery of the first conductive layer by performing a first ashing process on the first PR pattern; patterning the semiconductor layer using the second PR pattern; forming source/drain electrodes using the second PR pattern; forming a passivation layer and a pixel electrode on the first substrate; attaching a second substrate to the first substrate; and forming a liquid crystal layer between the first substrate and the second substrate.

REFERENCES:
patent: 2004/0227893 (2004-11-01), Nam et al.
patent: 2001281693 (2001-10-01), None
patent: 2002341382 (2002-11-01), None
patent: 2002-350899 (2002-12-01), None
Computer-generated translation of JP 2002-350899 (Dec. 2002).

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