Method for fabricating group III-V compound semiconductor...

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate

Reexamination Certificate

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Reexamination Certificate

active

06933213

ABSTRACT:
Provided is a compound semiconductor substrate fabrication method involving: preparing a base substrate; forming a first buffer layer on the prepared base substrate; forming a semiconductor layer on the first buffer layer; and removing the base substrate.

REFERENCES:
patent: 5290393 (1994-03-01), Nakamura
patent: 5847409 (1998-12-01), Nakayama
patent: 5905275 (1999-05-01), Nunoue et al.
patent: 5927995 (1999-07-01), Chen et al.
patent: 5985687 (1999-11-01), Bowers et al.
patent: A-3-161922 (1991-07-01), None
patent: 2000-105321 (2000-04-01), None

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