Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1993-01-27
1995-03-07
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430 20, 430324, 430328, 430329, 427250, 427259, 1566591, G03F 726, G03C 516
Patent
active
053957407
ABSTRACT:
A method of forming electrode patterns on a substrate. A transparent substrate (10) is patterned with a photoresist layer (14) on the front side so that portions (18) of the substrate are revealed. A metal oxide layer (12) is deposited on the patterned photoresist layer and the revealed portions of the substrate. The patterned photoresist layer is then exposed to actinic radiation (19) through the back side (25) of the transparent substrate. The photoresist pattern (20) is removed, carrying with it those portions of the metal oxide layer deposited on the photoresist layer, forming an electrode pattern (22) by a lift-off technique.
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patent: 3982943 (1976-09-01), Feng et al.
patent: 4004044 (1977-01-01), Franco et al.
patent: 4174219 (1979-11-01), Andres
patent: 4670097 (1987-06-01), Abdalla et al.
patent: 4827326 (1989-05-01), Altman
IBM Technical Disclosure Bulletin, by Fredericks, et al., titled "Polysulfone Lift-Off Masking Technique" IBM Corp. vol. 20, No. 3, Aug., 1977.
IBM Technical Disclosure Bulletin, by Dalal, et al., titled "Chrome-Copper-Chrome Lift-Off Process", IBM Corp. vol. 20, No. 8, Jan., 1978.
Arledge John K.
Davis James L.
Swirbel Thomas J.
Dorinski Dale W.
Duda Kathleen
Motorola Inc.
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