Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Reexamination Certificate
2011-01-04
2011-01-04
McPherson, John A. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
C430S323000
Reexamination Certificate
active
07862989
ABSTRACT:
The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.
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patent: 2004/0224261 (2004-11-01), Resnick et al.
patent: 2005/0184376 (2005-08-01), Salmon
Carter Kenneth Raymond
Colburn Matthew E.
McClelland Gary M.
Pfeiffer Dirk
Beck Thomas A.
International Business Machines - Corporation
McPherson John A.
Morris Daniel P.
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