Method for fabricating Bi thin film and device using the same

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S421000, C257S426000, C438S003000, C438S308000

Reexamination Certificate

active

07095070

ABSTRACT:
In a method for fabricating a Bi thin film having a great MR (magnetoresistance) at room temperature and a method for fabricating a spintronics device using the same, the Bi thin film is fabricated by an electrodepostiting method and a sputtering method and has very great MR characteristics at room temperature, and it can be applied to various spintronics devices.

REFERENCES:
patent: 6187165 (2001-02-01), Chien et al.
patent: 6358392 (2002-03-01), Yang et al.
patent: 6919213 (2005-07-01), Flatte et al.
patent: WO 00/37715 (2000-06-01), None
Gang Xiao et al., “Very Large Magnetoresistance in Electrodeposited Single-Crystal Bi Thin Films (Invited),” Journal of Applied Physics, vol. 87, No. 9, May 1, 2000, pp. 4659.
Liu et al., “Structural and Magneto-Transport Properties of Electrodeposited Bismuth Nanowires,” Applied Physics Letters, American Institute of Physics, New York, vol. 73, No. 10, Sep. 7, 1998, pp. 1436-1438.
Cho et al., “Large Magnetoresistance in Post-Annealed Polycrystalline and Epitaxial Bi Thin Films,” J. of Magnetism and Magnetic Materials, Elsevier Science B.V., Netherlands, vol. 239, Feb. 2002, pp. 201-203.
European Search Report dated Aug. 10, 2004.

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