Method for fabricating an integrated semiconductor circuit

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07007260

ABSTRACT:
A method for fabricating an integrated semiconductor circuit having at least two different wiring forms realized in a same metallization plane includes drawing each of the different wiring forms on respectively different layer types. In this manner, the at least two different wiring forms can be individually and jointly analyzed.

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