Method for fabricating an angled diffraction grating

Details Method for fabricating an angled diffraction grating Method for fabricating an angled diffraction grating

1991-04-22

1992-05-26

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156633, 156654, 1566591, 156662, 156663, 156668, 20419234, 359569, H01L 21306, B44C 122, B29C 3700, C03C 1500

Patent

active

051164612

ABSTRACT:
A method for fabricating an angled diffraction grating (12) is provided. An optical medium (13) with fine lines and spaces that are defined in an etch mask is provided. Transferring the defined lines and spaces of the etch mask into the optical medium (13) at a desirable angle is achieved by an etching means, thereby resulting in an angled diffraction grating (12).

REFERENCES:
patent: 4405405 (1983-09-01), Fujii et al.
Norman, "Microwave Plasma Boosted Chemically Assisted Ion Beam Etching System for Sculpting Integrated Optoetronic Devices and Circuits", Thesis, Jun. 1990.

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