Method for fabricating active substrate

Details Method for fabricating active substrate Method for fabricating active substrate

1994-07-11

1997-04-22

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430313, 430317, 430318, 430330, 430329, 438 30, 438164, 438151, G03F 700

Patent

active

056228147

ABSTRACT:
A method for fabricating an active matrix substrate for forming constituent elements such as a semiconductor layer, a passivation layer, an electrode material and other elements, uses a photoresist exposed from the reverse side of the substrate, using the gate electrode pattern made of opaque material on a transparent substrate as the mask. This method contributes to lowering the cost and improving the performance of semiconductor devices.

REFERENCES:
patent: 4174219 (1979-11-01), Andres
patent: 4277884 (1981-07-01), Hsu
patent: 4578343 (1986-03-01), Kosemura et al.
patent: 4931351 (1990-06-01), McColgin et al.
patent: 4968638 (1990-11-01), Wright et al.

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