Method for fabricating a thin film magnetic head

Details Method for fabricating a thin film magnetic head Method for fabricating a thin film magnetic head

2007-02-13

2007-02-13

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S311000, C430S330000

Reexamination Certificate

active

10844400

ABSTRACT:
A plating underlayer is formed on an insulating film. An anti-reflection film is formed on the plating underlayer. A photoresist is formed over the antireflection film62.The photoresist and the antireflection film are exposed and developed to form a resistframe made thereof. A second magnetic layer is formed within an inner pattern enclosed by the resistframe. The anti-reflection film is made of a material soluble for a developer through exposure.

REFERENCES:
patent: 5691111 (1997-11-01), Iwasa et al.
patent: 6465149 (2002-10-01), Kamijima et al.
patent: A 9-180127 (1997-07-01), None

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