Method for fabricating a thin film and metal line of...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material

Reexamination Certificate

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C438S685000, C257SE21040

Reexamination Certificate

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07439175

ABSTRACT:
A method for forming a thin film of a semiconductor device is provided. The method includes forming a TaN film on a semiconductor substrate, and converting a portion of the TaN film into a Ta film by reacting the TaN film with NO2. The Ta film is formed to have a thickness which is about half of the thickness of the TaN film.

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