Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2002-02-12
2004-09-21
Ruff, Mark F. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S311000, C430S314000, C430S316000, C430S317000, C430S318000, C430S322000, C430S394000
Reexamination Certificate
active
06794119
ABSTRACT:
FIELD OF THE INVENTION
This invention relates to microfabrication. In particular, it relates to the microfabrication of a structure for a Microelectromechanical Systems (MEMS) device.
BACKGROUND
Microfabrication techniques used to fabricate MEMS devices generally involve the deposition of one or more layers on a substrate and the subsequent patterning of the layers to produce useful structures. One technique for patterning a layer involves the use of photolithography. With photolithography a photographic definition of a desired pattern on a photo or optical mask is used to impart the pattern onto a surface of the layer. When manufacturing a MEMS device usually several masking steps are required, each masking step adding to the cost of the device. Accordingly, it is desirable to reduce the number of masking steps required during fabrication of a MEMS device.
SUMMARY OF THE INVENTION
According to one aspect of the invention there is provided a microfabrication process comprising depositing a first layer on a substrate; patterning the first layer; depositing a second layer on the first layer; and patterning the second layer using the first layer as a photomask.
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patent: 5674757 (1997-10-01), Kim
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patent: 5976902 (1999-11-01), Shih
patent: 2001/0040649 (2001-11-01), Ozaki
PCT Search Report, Int'l. Application No. PCT/US02/13442, mailed Sep. 13, 2002, (1 pg.).
Barreca Nicole
Blakely , Sokoloff, Taylor & Zafman LLP
Iridigm Display Corporation
Ruff Mark F.
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