Method for fabricating a resist pattern, a method for...

Details Method for fabricating a resist pattern, a method for... Method for fabricating a resist pattern, a method for...

2005-07-12

2005-07-12

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S316000, C430S319000, C430S328000, C430S329000

Reexamination Certificate

active

06916597

ABSTRACT:
A thin film to be milled is formed on a substrate1, and thereafter, a polymethylglutarimide layer and a photoresist layer are coated. Then, the photoresist layer is exposed and developed via a given mask, to form a pre-resist pattern. Then, ashing treatment is performed for the pre-resist pattern to a narrowed resist pattern. Subsequently, the thin film to be milled is milled via the resist pattern to obtain a patterned thin film.

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