Method for fabricating a micro structure

Details Method for fabricating a micro structure Method for fabricating a micro structure

2006-05-10

2008-08-26

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S060000, C438S075000, C257SE21170, C257SE21189, C257SE21278, C257SE21613, C257SE29228

Reexamination Certificate

active

07416908

ABSTRACT:
A method for fabricating a micro structure includes depositing a first layer of a first material over a substrate; patterning a first hard mask over the first layer; depositing a second layer of a second material over the first layer and the first hard mask; patterning a second hard mask over the second layer; and selectively removing the first material and the second material not covered by any of the first mask and the second mask to produce over the substrate the micro structure having a first structure portion having a first height and a second structure portion having a second height.

REFERENCES:
patent: 6356378 (2002-03-01), Huibers
patent: 6396619 (2002-05-01), Huibers et al.
patent: 6529310 (2003-03-01), Huibers et al.
patent: 6538800 (2003-03-01), Huibers
patent: 6827866 (2004-12-01), Novotny
patent: 6992810 (2006-01-01), Pan et al.
patent: 2002/0071166 (2002-06-01), Jin et al.
patent: 2002/0071169 (2002-06-01), Bowers et al.
patent: 2005/0128564 (2005-06-01), Pan

Affiliated with

Also associated with

Rating

Method for fabricating a micro structure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating a micro structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating a micro structure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4005892