Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate
2006-04-18
2006-04-18
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
Insulated gate formation
C438S591000, C257S410000
Reexamination Certificate
active
07030000
ABSTRACT:
A given metallic oxide film is epitaxially grown on a substrate. Then, the substrate and the metallic oxide film are thermally treated to mix the constituent elements of the substrate with the constituent metallic oxide elements of the metallic oxide film and to form a metallic oxide film of high dielectric constant on the substrate through the mixing of the constituent elements.
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Kondo Hiroki
Sakai Akira
Sakashita Mitsuo
Sakashita Shinsuke
Yasuda Yukio
Nagoya University
Pert Evan
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