Method for fabricating a flat panel display

Details Method for fabricating a flat panel display Method for fabricating a flat panel display

2011-03-29

2011-03-29

Landau, Matthew C (Department: 2813)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S096000, C438S097000, C438S482000, C438S486000, C438S488000, C257S049000, C257S051000, C257S052000, C257S057000, C257S059000, C257S064000, C257S066000, C257S070000, C257S072000, C257SE27132, C257SE29289

Reexamination Certificate

active

07915103

ABSTRACT:
The method for fabricating a flat panel display includes performing a first crystallization process to re-crystallize an amorphous silicon layer on a glass substrate to make the amorphous silicon layer become a polysilicon layer, forming a patterned absorbing layer to cover an active area pattern of a driving TFT and to expose portions of the polysilicon layer, performing a second crystallization process to re-crystallization the exposed portions of the polysilicon layer so that the exposed portions of the polysilicon layer has a different grain structure from the grain structure of the driving TFT, removing the patterned absorbing layer, and removing portions of the polysilicon layer to form an active area of the driving TFT and an active area of a switching TFT area in the exposed portions of the polysilicon layer of each sub-pixel.

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