Method for fabricating a dual damascene contact in an...

Details Method for fabricating a dual damascene contact in an... Method for fabricating a dual damascene contact in an...

2007-04-24

2007-04-24

Mai, Anh Duy (Department: 2814)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S789000, C438S508000

Reexamination Certificate

active

11165224

ABSTRACT:
A hole is formed in an insulating film containing silicon and carbon. The insulating film has a density or a carbon concentration varying gradually in the direction of the thickness thereof.

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