Method for examining surface of copper layer in circuit board an

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430 30, 430315, 430318, 356357, 356381, G03F 700

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056331215

ABSTRACT:
The surface of a copper layer in a circuit board is irradiated with a beam, and the degree of progress of oxidation of the surface of the copper layer is determined by taking advantage of the resultant reflected beam (for example, an intensity or a hue of a reflected beam). Then, the step of coating a resist is carried out only when the thickness of the copper oxide film is not more than about 10 nm. Alternatively, the step of coating a resist may be carried out after removal or reduction of the oxide film or cladding of the oxide film with copper.
The present invention enables occurrence of peeling of the resist or dive of plating to be prevented in the step of effecting selective etching or plating of a copper layer in a circuit board using a resist pattern as a mask.

REFERENCES:
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patent: 4899055 (1990-02-01), Adams
patent: 4957370 (1990-09-01), Tominaga
patent: 5068810 (1991-11-01), Ott
patent: 5120966 (1992-06-01), Kondo
Yamagishi et al., "A Multicolor Projection Display Using Nematic-Cholesteric Liquid Crystal," IEEE Transactions on Electron Devices, vol. 36, No. 9, Sep. 1989, pp. 1888-1891.

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