Method for examining a specimen in a particle beam instrument

Details Method for examining a specimen in a particle beam instrument Method for examining a specimen in a particle beam instrument

1989-10-02

1990-09-04

Berman, Jack I.

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

250307, 250309, 250311, 313336, 313420, H01J 3728

Patent

active

049547054

ABSTRACT:
For localization of the defects on mask and wafers generated by particle occupation, electron-optical imaging methods have been developed where the subject to be examined is scanned with a focused electron beam. Since the signal-to-noise ratio needed for a reliable defect recognition limits the scan rate, the throughput of inspected subjects remains low. It is therefore proposed that the subject be scanned with a line-shaped electron probe and that the triggered secondary electons be imaged onto a detector with the assistance of an electron optics comprising an immersion lens, whereby one line element of the surface region illuminated by the electron probe is assigned to each detector element.

REFERENCES:
patent: 1943109 (1934-01-01), Coolidge
patent: 3374386 (1968-03-01), Charbonnier et al.
patent: 3875416 (1975-04-01), Spicer
patent: 4724328 (1988-02-01), Lischke
patent: 4769543 (1988-09-01), Plies
patent: 4853545 (1989-08-01), Rose
May, P. et al., "Picosecond Photoelectron Scanning Electron Microscope for Noncontact Testing of Integrated Circuits", Appl. (R2).
van Gorkon, G. G. P. et al., "Silicon Cold Cathodes as Possible Sources in Electron Lithography Systems", J. Vac. Sci. Technol. 5(4), SR1 International Technical Note 2, Nov. 1984.
Phys. Lett. 51(2), Jul. 13, 1987, p. 145 and abstract.

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