Method for evaluating photo mask and method for...

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Reexamination Certificate

active

10705954

ABSTRACT:
A method for evaluating a photo mask comprises preparing a photo mask including a unit drawing pattern, finding a dimensional variation relating to the photo mask, the dimensional variation including first and second dimensional variations, the first dimensional variation occurring due to a positional displacement and size mismatch of the unit drawing pattern in the photo mask and the second dimensional variation occurring due to etching and development relating to a manufacturing of the photo mask, estimating a deteriorated amount of an exposure latitude occurring due to the dimensional variation of the photo mask using the dimensional variation and a degree of influence of the dimensional variation for the exposure latitude, and judging quality of the photo mask by comparing the deteriorated amount of the exposure latitude and an allowable deteriorated amount of the exposure latitude.

REFERENCES:
patent: 6208469 (2001-03-01), Matsuura
patent: 7001697 (2006-02-01), Park et al.
patent: 7008731 (2006-03-01), Nojima et al.
patent: 2002-260285 (2002-09-01), None
patent: 2002-351048 (2002-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for evaluating photo mask and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for evaluating photo mask and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for evaluating photo mask and method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3837259

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.