X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2005-11-08
2005-11-08
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S071000
Reexamination Certificate
active
06963630
ABSTRACT:
A method for evaluating an SOI layer on an insulating film disposed on a base substrate so as to construct an SOI substrate, includes: measuring a first diffraction intensity distribution of an X-ray beam corresponding to an incident angle formed with the X-ray beam and a front surface of the SOI substrate by irradiating the X-ray beam onto the base substrate; measuring a second diffraction intensity distribution of the X-ray beam for the incident angle formed with the X-ray beam and the front surface of the SOI substrate by irradiating the X-ray beam onto the SOI layer; determining an evaluation diffraction peak corresponding to the SOI layer from the first and the second diffraction intensity distribution; and observing an X-ray topograph by irradiating the X-ray beam on the SOI layer with a second incident beam angle of the evaluation diffraction peak.
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Tsuchiya Norihiko
Umezawa Kaori
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Glick Edward J.
Kabushiki Kaisha Toshiba
Kao Chih-Cheng Glen
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