Method for etching thin films of niobium and niobium-containing

Details Method for etching thin films of niobium and niobium-containing Method for etching thin films of niobium and niobium-containing

1979-11-23

1981-05-05

Kendall, Ralph S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430319, 427 63, 156656, 1566591, H01L 3902

Patent

active

042660084

ABSTRACT:
An improved method of preparing thin film superconducting electrical circuits of niobium or niobium compounds in which a thin film of the niobium or niobium compound is applied to a nonconductive substrate, and covered with a layer of photosensitive material. The sensitive material is in turn covered with a circuit pattern exposed and developed to form a mask of the circuit in photoresistive material on the surface of the film. The unmasked excess niobium film is removed by contacting the substrate with an aqueous etching solution of nitric acid, sulfuric acid and hydrogen fluoride, which will rapidly etch the niobium compound without undercutting the photoresist. A modification of the etching solution will permit thin films to be lifted from the substrate without further etching.

REFERENCES:
Brisbin et al., Low AC Loss Nb.sub.3 Sn Tape for Transmission Line Application, IEEE Trans. on Magnetics vol. Mag-15 No. 1, Jan. 1979.

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