Method for etching photolithographically produced quartz crystal

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 97, 216 80, 216 51, 438 50, B44C 122, C03C 1500, C03C 2506, H01L 21306

Patent

active

058338691

ABSTRACT:
A method (202) for etching photolithographically produced quartz crystal blanks for singulation. In a first step (202), a quartz wafer is plated on both sides with metal and subsequently coated on both sides with photoresist. In a second step (204), the photoresist is patterned and developed and the metal layer on one side is etched through to form a narrow channel in the quartz defining a perimeter of a quartz blank. In a third step (206), the quartz channel is preferentially etched partially into the wafer along parallel atomic planes to provide a mechanically weak junction between the quartz wafer and the blanks to be singulated. In a fourth step (208), the photoresist layers are stripped from the quartz wafer. In a final step (210), the quartz blank is cleaved substantially along the bottom of the quartz channel to singulate the crystal blanks from the quartz wafer.

REFERENCES:
patent: 4035674 (1977-07-01), Oguchi et al.
patent: 4542397 (1985-09-01), Biegelsen et al.
patent: 4632898 (1986-12-01), Fister et al.
patent: 4732647 (1988-03-01), Aine
patent: 4897360 (1990-01-01), Guckel et al.
patent: 5447601 (1995-09-01), Norris
patent: 5650075 (1997-07-01), Haas et al.
patent: 5681484 (1997-10-01), Zanzucchi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for etching photolithographically produced quartz crystal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for etching photolithographically produced quartz crystal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for etching photolithographically produced quartz crystal will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1513335

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.