Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1988-09-27
1991-04-16
Simmons, David A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
1566591, 156664, 156665, 252 792, B44C 122
Patent
active
050079840
ABSTRACT:
A method for etching a chromium film includes the steps of forming a resist having a phenol novolak resin as a principal chain on the chromium film formed on a substrate, and etching the chromium film using an etchant while stripping off the resist from the chromium film using an etchant containing nitric acid. A second method for etching a chromium film comprises the steps of forming an aluminum film or an aluminum alloy film on the chromium film formed on a substrate, forming a resist having a predetermined pattern on the aluminum film or the aluminum alloy film, etching the aluminum film or the aluminum alloy film and the chromium film using phosphoric acid, and removing by etching the aluminum film or the aluminum alloy film using phosphoric acid containing nitric acid after removing the resist.
REFERENCES:
patent: 4172004 (1979-10-01), Alcorn et al.
patent: 4350564 (1982-09-01), Wei
patent: 4725375 (1988-02-01), Fujii et al.
Kiyotake Naroaka and Koji Nihei, "Photo-Etching and Fine Structure Processing", Sogodenshi Shuppansha, May 10, 1977.
Endo Atsushi
Tsutsumi Michinari
Yada Toshio
Dung Thi
Mitsubishi Denki & Kabushiki Kaisha
Simmons David A.
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