Method for etching chromium film formed on substrate

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

1566591, 156664, 252 792, C23F 100

Patent

active

051835339

ABSTRACT:
A method for etching a chromium film includes the steps of forming a resist having a phenol novolak resin as a principal chain on the chromium film formed on a substrate, and etching the chromium film using an etchant while stripping off the resist from the chromium film using an etchant containing nitric acid. A second method for etching a chromium film includes the steps of forming an aluminum film or an aluminum alloy film on the chromium film formed on a substrate, forming a resist having a predetermined pattern on the aluminum film or the aluminum alloy film, etching the aluminum film or the aluminum alloy film and the chromium film using phosphoric acid, and removing by etching the aluminum film or the aluminum alloy film using phosphoric acid containing nitric acid after removing the resist.

REFERENCES:
patent: 4725375 (1988-02-01), Fujii et al.
patent: 5007984 (1991-04-01), Tsutsumi et al.
Janus, "Chemical Etch Rate Studies on Sputtered Chromium Films", J. Electrochem. Soc., vol. 119, No. 3, Mar. 1972, pp. 392-396.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for etching chromium film formed on substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for etching chromium film formed on substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for etching chromium film formed on substrate will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-5379

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.