Method for etching a phosphorus-nitrogen-oxygen coating

Details Method for etching a phosphorus-nitrogen-oxygen coating Method for etching a phosphorus-nitrogen-oxygen coating

1979-05-25

1981-01-06

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156628, 156653, 156655, 1566591, 252 792, 252950, B44C 122, C03C 1500, C03C 2506

Patent

active

042434750

ABSTRACT:
A composition is described which comprises amorphous phosphorus-nitrogen-oxygen material having excellent thermal stability and low reactivity to a wide variety of chemicals. The material is manufactured using a chemical vapor deposition process. The reaction chamber is maintained at a temperature between about 400.degree.-900.degree. C. with a suitable substrate placed therein. Reaction gases containing phosphorus-nitrogen-bearing compounds and a source of oxygen are passed through the chamber to deposit the phosphorus-nitrogen-oxygen film onto the substrate.

REFERENCES:
patent: 3524776 (1970-08-01), Hampikian et al.
patent: 3657030 (1972-04-01), Porter
patent: 3666574 (1972-05-01), Tarneja et al.

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