Method for etching a pattern

Details Method for etching a pattern Method for etching a pattern

1989-08-04

1990-09-04

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156653, 156656, 156657, 1566591, 357 65, 437200, 437203, B44C 122, C03C 1500, C03C 2506, C23F 102

Patent

active

049542184

ABSTRACT:
A photoresist layer having a prescribed pattern is formed on a substrate to be etched. The substrate is immersed into a predetermined solution to form a layer on the substrate except on those portions where the photoresist layer is formed. The photoresist layer is removed, and the substrate is etched using the remaining layer as a mask.

REFERENCES:
patent: 4261792 (1981-04-01), Tsuji et al.
patent: 4496419 (1985-01-01), Nulman et al.

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