Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-10-13
1995-06-06
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419216, 204 192, C23C 1434
Patent
active
054219752
ABSTRACT:
Thin film media characterized by the utilization of a substantially peritectic seed alloy layer which is sputter deposited so as to provide dispersed, substantially peritectic and homogenous globules underlying subsequently deposited media layers. These media layers may include a metal layer such as chrome and a magnetic layer such as an alloy of cobalt, chromium, and platinum and possibly other ingredients.
REFERENCES:
patent: 4539265 (1985-09-01), Yazawa
patent: 4950548 (1990-08-01), Furusawa et al.
patent: 5037515 (1991-08-01), Tsoi et al.
patent: 5134038 (1992-07-01), Baseman et al.
Eltoukhy Atef H.
Huang Hung-Chang W.
Mahvan Nader
Teng Edward
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