Method for elimination of alignment field gap

Details Method for elimination of alignment field gap Method for elimination of alignment field gap

1996-06-14

1999-02-16

Nguyen, Nam

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430 5, 430 30, 430312, G03C 500

Patent

active

058718893

ABSTRACT:
A method of photomask reticle design provides for greatly increased tolerance to adjacent exposure field alignment and/or stepper magnification errors, thus eliminating gaps between adjacent exposure fields in the fabrication of semiconductor integrated circuit devices.The resulting insurance of complete exposure of photoresist eliminates the formation of non-exposed unwanted photoresist residues or stringers, which constitute defects in the manufacture of such devices.

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patent: 5290711 (1994-03-01), Yanagisawa
patent: 5376482 (1994-12-01), Hwang et al.

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