Method for dry etching a chromium or chromium oxide film

Details Method for dry etching a chromium or chromium oxide film Method for dry etching a chromium or chromium oxide film

1985-08-20

1986-09-23

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 156664, 156667, 156345, 20419232, 252 791, C23F 102, B44C 122, C03C 1500, C03C 2506

Patent

active

046134018

ABSTRACT:
The dry etching rate of a Cr film has been increased by adding ethyl or methyl alcohol vapor to an etchant gas containing a halide of a hydrocarbon such as CCl.sub.4 and oxygen gas. The dry etching rate increase is attributed to the reduction reaction of a dry etching product, CrO.sub.2 Cl.sub.2, into chemically stable CrCl.sub.3, the reduction reaction suppresses deposition of Cr generated by the decomposition of chemically unstable CrO.sub.2 Cl.sub.2.

REFERENCES:
patent: 3951709 (1974-02-01), Jacob
patent: 4445966 (1984-05-01), Carlson et al.

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