Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2011-01-04
2011-01-04
Davis, Daborah Chacko (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S316000, C430S394000, C430S397000
Reexamination Certificate
active
07862985
ABSTRACT:
A method for double patterning a thin film on a substrate is described. The method includes forming the thin film to be patterned on the substrate, forming a developable anti-reflective coating (ARC) layer on the thin film, and forming a layer of photo-resist on the ARC layer. Thereafter, the layer of photo-resist and the ARC layer are imaged with a first image pattern, and developed, thus forming the first image pattern in the ARC layer. The photo-resist is removed and another layer of photo-resist is formed on the ARC layer. Thereafter, the other layer of photo-resist and the ARC layer are imaged with a second image pattern, and developed, thus forming the second image pattern in the ARC layer. The other photo-resist layer is removed and a double patterned ARC layer remains for etching the underlying thin film.
REFERENCES:
patent: 5753417 (1998-05-01), Ulrich
patent: 7432191 (2008-10-01), Stamper et al.
patent: 2002/0081531 (2002-06-01), Jain
patent: 2003/0129531 (2003-07-01), Oberlander et al.
patent: 2003/0205658 (2003-11-01), Voisin
patent: 2005/0074699 (2005-04-01), Sun et al.
patent: 2005/0116231 (2005-06-01), Kang et al.
patent: 2005/0153538 (2005-07-01), Tsai et al.
patent: 2005/0167394 (2005-08-01), Iiu et al.
patent: 2006/0003268 (2006-01-01), Hong et al.
patent: 2006/0177772 (2006-08-01), Abdallah et al.
patent: 2006/0222968 (2006-10-01), Talin et al.
patent: 2006/0223245 (2006-10-01), Pellens et al.
patent: 2006/0290012 (2006-12-01), Sadjadi
patent: 2007/0077523 (2007-04-01), Finders
patent: 2007/0148598 (2007-06-01), Colburn et al.
patent: 2007/0166648 (2007-07-01), Ponoth et al.
patent: 2008/0020327 (2008-01-01), Yang et al.
patent: 2008/0171293 (2008-07-01), Dunn
European Patent Office, International Search Report and Written Opinion received in corresponding PCT Application No. PCT/US2007/077166 dated Dec. 20, 2007, 13 pgs.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/623,247 dated Oct. 9, 2008, 14 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,261 dated Jun. 23, 2008, 14 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,477 dated Jun. 23, 2008, 22 pp.
State Intellectual Property Office of the People'S Republic of China, First Office Action received in related Chinese Patent Application No. 200710151302.9 dated Jan. 16, 2009, 7 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,477 dated Jan. 12, 2009, 14 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,420 dated Dec. 23, 2008, 23 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,261 dated Jan. 15, 2009, 12 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/623,237 dated Sep. 15, 2009, 16 pp.
U.S. Patent and Trademark Office, Final Office Action received in related U.S. Appl. No. 11/534,261 dated Aug. 28, 2009, 12 pp.
U.S. Patent and Trademark Office, Final Office Action received in related U.S. Appl. No. 11/534,477 dated Aug. 7, 2009, 17 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,538 dated Jul. 13, 2009, 16 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/623,247 dated Jun. 2, 2009, 17 pp.
U.S. Patent and Trademark Office, Non-final Office Action received in related U.S. Appl. No. 11/534,477 dated Oct. 23, 2009, 16 pp.
U.S. Patent and Trademark Office, Final Office Action received in related U.S. Appl. No. 11/623,247 dated Dec. 18, 2009, 18 pp.
U.S. Patent and Trademark Office, Final Office Action received in related U.S. Appl. No. 11/534,538 dated Jan. 26, 2010, 12 pp.
U.S. Patent and Trademark Office, Non-Final Office Action received in related U.S. Appl. No. 11/623,237 dated Mar. 9, 2010, 18 pp.
U.S. Patent and Trademark Office, Advisory Action received in related U.S. Appl. No. 11/623,247 dated Mar. 10, 2010, 7 pp.
U.S. Patent and Trademark Office, Non-Final Official Action received in related U.S. Appl. No. 11/534,261 dated Apr. 5, 2010, 13 pp.
U.S. Patent and Trademark Office, Non-Final Official Action received in related U.S. Appl. No. 11/534,538 dated Apr. 12, 2010, 15 pp.
U.S. Patent and Trademark Office, Final Official Action received in related U.S. Appl. No. 11/534,477 dated Apr. 30, 2010, 10 pp.
U.S. Patent and Trademark Office, Non-Final Office Action received in related U.S. Appl. No. 11/534,477 dated Jul. 22, 2010, 14 pp.
Chacko Davis Daborah
Tokyo Electron Limited
Wood Herron & Evans LLP
LandOfFree
Method for double patterning a developable anti-reflective... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for double patterning a developable anti-reflective..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for double patterning a developable anti-reflective... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2744522