Method for double imaging a developable anti-reflective coating

Details Method for double imaging a developable anti-reflective coating Method for double imaging a developable anti-reflective coating

2006-09-22

2010-12-28

Chacko Davis, Daborah (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S397000, C430S313000, C430S396000

Reexamination Certificate

active

07858293

ABSTRACT:
A method for double patterning a thin film on a substrate is described. The method includes forming the thin film to be patterned on the substrate, forming a developable anti-reflective coating (ARC) layer on the thin film, and forming a layer of photo-resist on the ARC layer. Thereafter, the layer of photo-resist and the ARC layer are double imaged, and developed. Once the layer of photo-resist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film.

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