Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1983-07-08
1984-10-02
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
355 77, 356 51, 430142, 430327, G03C 518, G03C 516, G03C 508, G03F 720
Patent
active
044748647
ABSTRACT:
A process for setting the exposure speed of photolithography instruments is described, using a method of dosimetry based on photoactive compound bleaching of photoresist. A curve of light absorbance to exposure speed and a calibration curve of light absorbance to dose are determined for a photoresist. The exposure speed for any desired degree of resist bleaching can be set using the first curve, and the exposure speed for a predetermined dosage can be set by determining the common light absorbance value on the exposure speed and dosage curves.
REFERENCES:
patent: 3046118 (1962-07-01), Schmidt
patent: 3077401 (1963-02-01), van der Grinten et al.
patent: 3397315 (1968-08-01), Johnston
patent: 3953135 (1976-04-01), Levy et al.
patent: 3977872 (1976-08-01), Hellmig
patent: 4128338 (1978-12-01), Wong
patent: 4212395 (1980-07-01), Canavello
patent: 4259430 (1981-03-01), Kaplan et al.
Chow Ming-Fea
Lopata Alexander D.
Lyons Christopher F.
McIntosh Robert C.
Scaduto Anthony F.
International Business Machines - Corporation
Schilling Richard L.
LandOfFree
Method for dose calculation of photolithography projection print does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for dose calculation of photolithography projection print, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for dose calculation of photolithography projection print will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-527030