Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
Reexamination Certificate
2006-12-05
2010-10-05
Landau, Matthew C (Department: 2813)
Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Diffusing a dopant
C257SE21468
Reexamination Certificate
active
07807556
ABSTRACT:
A method for doping impurities into a device layer includes providing a carbonized dopant layer including one or more dopant impurities over a device layer and heat treating the carbonized dopant layer to thermally diffuse the dopant impurities into the device layer.
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Dunne Greg Thomas
Soloviev Stanislav Ivanovich
Stum Zachary Matthew
Tucker Jesse Berkley
Agosti Ann M.
General Electric Company
Hall Jessica
Landau Matthew C
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