Method for developing positive acting light-sensitive planograph

Details Method for developing positive acting light-sensitive planograph Method for developing positive acting light-sensitive planograph

1980-04-30

1981-03-31

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430141, G03F 702

Patent

active

042594340

ABSTRACT:
A development method which comprises imagewise exposing a positive acting light-sensitive planographic printing plate comprising an aluminum support and a light-sensitive layer of an o-quinonediazide compound formed thereon, and then developing the exposed plate with a developer, comprising an aqueous solution of an alkali metal silicate, adding a supplementary solution comprising an aqueous solution of an alkali metal silicate to the developer to compensate for the degradation of the developer brought about by development and/or by carbon dioxide in the air; wherein the developer comprises an aqueous solution of an alkali metal salt having an [SiO.sub.2 ]/[M] ratio of from 0.5 to 0.75 and an SiO.sub.2 concentration of from 1 to 4% by weight based on the total weight of the developer, where [SiO.sub.2 ] represents the concentration of SiO.sub.2 per unit volume expressed as gram-molecules, and [M] represents the concentration of the alkali metal per unit volume expressed as gram-atoms, and the supplementary solution comprises an aqueous solution of an alkali metal silicate having an [SiO.sub.2 ]/[M] ratio of from 0.25 to 0.75.

REFERENCES:
patent: 3869292 (1975-03-01), Peters
patent: 4123279 (1978-10-01), Kobayashi
DeForest = Photoresist Materials and Processes, McGraw-Hill Book Company, New York, Jun. 19, 1975, pp. 194-195.

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