Method for developing negative photoresists

Details Method for developing negative photoresists Method for developing negative photoresists

1988-10-21

1989-12-12

Dees, Jose G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430325, 430331, G03C 500

Patent

active

048867276

ABSTRACT:
A process is provided for developing images in exposed negative photoresists which comprises treating a substrate coated with the photoresist with a mixture of trichloroethane and from about 5 weight % to about 17 weight % of an aliphatic alcohol, preferably isopropanol or tert-butanol, which is heated to an elevated temperature. The alcohol is present in an amount up to that forming a constant boiling composition (azeotropic compositions).

REFERENCES:
patent: 3932297 (1976-01-01), Clementson et al.
patent: 4069076 (1978-01-01), Fickes
patent: 4162919 (1979-07-01), Richter et al.
patent: 4320188 (1982-03-01), Heinz et al.
Kodak, "Photofabrication Methods with Kodak Photo Resist," Bulletin #P-246, p. 19, date unknown.

Affiliated with

Also associated with

Rating

Method for developing negative photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for developing negative photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for developing negative photoresists will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2121269