Method for developing a waterless light-sensitive lithographic p

Details Method for developing a waterless light-sensitive lithographic p Method for developing a waterless light-sensitive lithographic p

1990-10-23

1992-06-16

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430309, 430331, G03F 732

Patent

active

051224380

ABSTRACT:
A method of developing a waterless light-sensitive lithographic printing plate having a support and, provided thereon, a light-sensitive layer comprising a diazo resin and a silicone gum layer with a developer is disclosed. The developer comprises an organic carboxylic acid or salt thereof, water, and at least one of a sulfite and a surfactant.

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patent: 4350756 (1982-09-01), Burch et al.
patent: 4378423 (1983-03-01), Suezawa et al.
patent: 4395480 (1983-07-01), Sprintschnik
patent: 4579811 (1986-04-01), Schell et al.
patent: 4874686 (1989-10-01), Urabe et al.
patent: 4963472 (1990-10-01), Schlosser et al.

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