Method for developing a photoresist pattern

Details Method for developing a photoresist pattern Method for developing a photoresist pattern

2005-03-29

2005-03-29

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Photographic medium or cartridge sensing

C396S604000, C396S611000, C396S626000, C118S052000, C430S030000

Reexamination Certificate

active

06872014

ABSTRACT:
The present invention relates to a method for developing a photoresist pattern. The method consists of mixing a concentrated chemical solution with a solvent to obtain a diluted chemical solution of a predetermined concentration. In this method, the mixing is done in a fabrication facility where the substrates are processed. The diluted chemical solution is then applied onto the photoresist pattern. Analysis of the pattern is then carried out to detect any defects or pattern collapse on the substrate. In the event that defects and/or pattern collapse occur, the predetermined concentration is adjusted to reduce the phenomenon.

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