Method for determining wavefront aberrations

Details Method for determining wavefront aberrations Method for determining wavefront aberrations

2007-04-24

2007-04-24

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C356S515000, C356S520000

Reexamination Certificate

active

11389053

ABSTRACT:
In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.

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