Method for determining lithographic focus and exposure

Optics: measuring and testing – Lens or reflective image former testing – Focal length measuring

Reexamination Certificate

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Details

C356S124000, C356S601000, C356S625000, C356S636000

Reexamination Certificate

active

07656512

ABSTRACT:
A method for determining one or more process parameter settings of a photolithographic system is disclosed.

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English abstract for Japanese Patent Publication No. 4-169667.

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