Method for determining layer thickness ranges

Details Method for determining layer thickness ranges Method for determining layer thickness ranges

2006-01-10

2006-01-10

Toatley, Jr., Gregory (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

06985237

ABSTRACT:
The invention concerns a method for the determination of layer thickness ranges of layers of a specimen, in which the reflection spectrum of the specimen is measured in a specified wavelength range and then smoothed, the number of extremes in the smoothed reflection spectrum is determined, and the determination of the layer thickness ranges is accomplished by comparison with the number of extremes in the modeled reflection spectra, such that for each layer the thickness in that layer is varied in steps having a predetermined increment, and a reflection spectrum is modeled. In a method of this kind, the wavelength range and the increments are specified in self-consistent fashion using a sensitivity criterion.

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Stenzel, Olaf, “Das Dunnschicht-spektrum,” Akademie Verlag, pp. 77-80.
Hauge, P.S., “Polycrystalline Silicon Film Thickness Measurement from Analysis of Visible Reflectance Spectra,” J. Opt. Soc. Am., vol. 69, No. 8, Aug. 1979, pp. 1143-1152.
Thompkins, Harland G. and McGahan, William A.,“Spectroscopic Ellipsometry and Reflectometry,” pp. 90-91.

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