X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2006-10-03
2006-10-03
Glick, Edward J. (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S071000
Reexamination Certificate
active
07116753
ABSTRACT:
Action on the tested wafer1is rendered with X-ray beam3converging in a point located inside the wafer or under it. Determination of relative position of the interference maxima is performed for diffraction reflections from crystallographic planes having the form of {nKK}, where n is equal to H, K or L and differs for distinct crystallographic planes.Means11for beam shaping creates beam3simultaneously acting on multiple crystallographic planes. Detectors13receive diffracted radiation in the whole angular range containing the interference maxima corresponding to the reflections from the irradiated planes.
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Ibraimov Nariman S.
Kotelkin Alexander V.
Kumakhov Muradin A.
Lyuttsau Alexander V.
Nikitina Svetlana V.
Glick Edward J.
Institute for Roentgen Optics
Kao Chih-Cheng Glen
McDermott Will & Emery LLP
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