Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-04-23
1999-05-18
Codd, Bernard
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302731, 430 30, G03C5/00
Patent
active
059050179
ABSTRACT:
A method for detecting microscopic differences in the thickness of a photoresist film coated on a wafer through naked eyes, which is capable of accurately controlling the critical dimension of the photoresist film patterns even in devices of 256 M DRAM or more and allows the yield to be analyzed with accuracy, comprising the steps of: subjecting the photoresist film to thermal treatment at a low temperature, to make some low molecular weight compounds or solvent molecules to remain within the photoresist film; forming a special material layer over the photoresist film within a certain thickness; and executing high-temperature thermal treatment, to gush up the remaining low-molecular weight compounds or solvent molecules from the photoresist film through relative thin parts of the special material layer.
REFERENCES:
patent: 4774164 (1988-09-01), Peavey et al.
patent: 4824763 (1989-04-01), Lee
patent: 5023203 (1991-06-01), Choi
patent: 5116704 (1992-05-01), Kwon
patent: 5153103 (1992-10-01), Kotuchi et al.
patent: 5326675 (1994-07-01), Niki et al.
patent: 5536534 (1996-07-01), Bae
patent: 5593813 (1997-01-01), Kim
Codd Bernard
Hyundai Electronics Industries Co,. Ltd.
Nath Gary M.
Novick Harold L.
LandOfFree
Method for detecting microscopic differences in thickness of pho does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for detecting microscopic differences in thickness of pho, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for detecting microscopic differences in thickness of pho will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1759224