Method for detecting implantation mask misalignment

Details Method for detecting implantation mask misalignment Method for detecting implantation mask misalignment

1995-05-03

1998-04-21

Trinh, Michael

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438 14, 438162, 438517, H01L 2177

Patent

active

057417326

ABSTRACT:
A test apparatus for determining alignment of an implantation mask in the construction of thin film transistors (TFTs), a method for determining the alignment of an implantation mask employed in the construction of TFTs, and a method for constructing TFTs, employing a test implantation mask for the construction of an implantation region for multiple adjacent TFTs, are provided in which the test implantation mask has a sloped or stepped profile such that the masked area increases as the test implantation mask extends from one TFT to another TFT.

REFERENCES:
patent: 4607213 (1986-08-01), Neukermans et al.
patent: 4647850 (1987-03-01), Henderson et al.
patent: 4648174 (1987-03-01), Temple et al.
patent: 5273915 (1993-12-01), Hwang et al.
patent: 5300454 (1994-04-01), Taft et al.
patent: 5334541 (1994-08-01), Adams et al.
patent: 5369050 (1994-11-01), Kawai

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