Method for designing shower plate for plasma CVD apparatus

Details Method for designing shower plate for plasma CVD apparatus Method for designing shower plate for plasma CVD apparatus

2008-02-28

2011-11-08

Yuan, Dah-Wei (Department: 1717)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C118S7230ER, C118S7230MW, C156S345470, C156S345310, C438S680000

Reexamination Certificate

active

08053036

ABSTRACT:
A method of designing a shower plate for a plasma CVD apparatus includes (a) providing a shower plate having a convex surface configured by a convex equation; (b) forming a film on a wafer using the shower plate in the plasma CVD apparatus; (c) determining a distribution of thickness of the film formed on the wafer by dividing a diametrical cross section of the film into multiple regions; (d) determining at least one secondary equation; and (e) designing a surface configuration of the shower plate by overlaying the secondary equation on the convex equation.

REFERENCES:
patent: 6631692 (2003-10-01), Matsuki et al.
patent: 6692576 (2004-02-01), Halpin et al.
patent: 7418921 (2008-09-01), Tsuji et al.
patent: 2007/0037390 (2007-02-01), Tsuji et al.
patent: 3207147 (2001-07-01), None
patent: WO 0208487 (2002-01-01), None
Naoto Tsuji et al., Plasma CVD Film-Forming Device, Invention Association Publication No. 2002-1338, issued Mar. 1, 2002, pp. 1-2.

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