Method for designing mask including forming a mesh dummy...

Details Method for designing mask including forming a mesh dummy... Method for designing mask including forming a mesh dummy...

2008-05-09

2011-12-06

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Layout generation

C716S050000, C716S051000, C716S052000, C716S054000, C716S056000, C430S005000, C430S030000

Reexamination Certificate

active

08074188

ABSTRACT:
A method for designing a mask is disclosed. A chip region can be defined and reduced to form a parent dummy pattern. A mesh dummy pattern can be formed, and portions where the parent dummy pattern and the mesh dummy pattern overlap each other can be removed to form offspring dummy patterns.

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