Method for deposition of amorphous hard carbon films

Details Method for deposition of amorphous hard carbon films Method for deposition of amorphous hard carbon films

1995-06-07

1997-04-01

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427523, 427595, 427249, B05D 306, C23C 1630

Patent

active

056163746

ABSTRACT:
A method for deposition of an amorphous hard carbon film containing silicon and nitrogen on a substrate wherein a carbon source, a silicon source and a nitrogen source are introduced in a deposition chamber in which the substrate are placed to deposit the film on said substrate.

REFERENCES:
patent: 4783368 (1988-11-01), Yamamoto et al.
patent: 5249554 (1993-10-01), Tamor et al.

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